| Miniproposals | ||||||||||
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| Operators | |
| Session leader(s): | Yuichi Takase |
| Physics operator(s): | Joseph Snipes |
| Engineering operator(s): | Joe Daigle,Frank Silva |
| Engineering Operator Run Comment |
| mp150a/takase/snipe/silva/daigle |
| Session Leader Plans |
| Physics Operators Plans |
| Session Leader Summaries |
| Entered: Jul 7 2004 03:49:16:523PM |
| Author: To Be Determined |
| MP150A D(He3) Minority Heating at 8T SL: Takase PO: Snipes EO: Silva Minority concentration scans at different densities. Measure power absorption from RF power steps. Overnight ECDC in D2 Transmitter #1 fixed (step start house) last night We had two 8T shots. These shots had low He3 concentrations compared to shots from the previous campaign (estimated to be less than 1%). As expected, more electron heating and less ion heating were observed (see addendum to MP150A). No parameter scans were made. Preliminary analysis indicates an absorption efficiency of less than 50%. At such low concentration single pass absorption is theoretically expected to be low. There should be a maximum in single pass absorption at somewhat higher concentration, around 5% (see addendum to MP150A). The run had to be terminated early because of high OH resistance reading. See the physics operator's summary for details. Shot 01 fiz Start from 960904038, modify to 8T, 1.2MA, nel=1.0 Start with 5ms He3 puff @ 90V (B side upper) 02 pla 7.8T, 1.2MA, nel=1.0, D: 0.85MW (crowbar @ 0.8s), E: 1.2MW, He3 5ms @ 90V Adjust TF, delay RF turn-on, add power notch-out for next shot. 03 pla 8.0T, nel=1.0, inj around 0.6s, didn't get to 8T till 0.8s D: 1.0MW (crowbar), E:1.2MW OH resistance is high 04 test OH test 05 test OH test 06 test OH test 07 test OH test 08 test OH test 09 test TF and OH test end of run |
| Physics Operator Summaries |
| Entered: Jul 7 2004 04:36:56:753PM |
| Author: To Be Determined |
| MP150A D(He3) 8Tesla ICRF Heating Session Leader: Yuichi Takase Physics Operator: Joseph Snipes Engineer in Charge: Frank Silva Overnight ECDC in deuterium. Power systems setup as for 960904038 except TF setup as for 960213016. Intend to run 8 T possibly up to 1.5 MA operation to get He3 minority heating with ICRF doing He3 concentration scans at different densities. Measurements will be made of the RF power absorption. The OH2U resistance across the felt metal connection increased sharply after each shot until after shot 3, it became higher than 3 uOhm and the run was stopped for OH test shots. After several tests, the resistance reached 6 uOhm and the run was officially cancelled. Shot 1: Copied shot 960904002, but modified the density to 1 x 10^20 m^-2 and made slight changes to the end of the flattop. Ip set to 1.2 MA. TF set to 8T flattop starting at about 0.6 sec to 1.2 sec. Fizzle! Shot 2: Reduced Br offset by 0.5 mT to 5.5 mT. Good shot. TF fault after the plasma. Reached 1.2 MA, but only 7.8 T. Shot 3: Reduced Br offset by another 0.5 mT to 5 mT. Moved ZXL down by 4 mm at 0.5 sec to accomodate the Fast Scanning Probe. Asked for 7kA more TF current to reach 8T. Good shot. Another TF fault after the plasma and instantaneous overcurrents at the alternator! OH resistance fault up to 3 uOhm. Shot 4: OH test. OH resistance up to about 3.9 uOhm. Could be a problem. Shot 5: OH test. OH resistance up to 3.95 uOhm. Shot 6: OH test. OH resistance down to 3.92 uOhm. Shot 7: OH test. OH resistance down to 3.89 uOhm. Shot 8: OH test. OH resistance at 3.89 uOhm. Shot 9: OH + TF test. Silva screwed up and ran other fields as well. OH resistance up to 4.4 uOhm. There appears to be a real problem. The OH2U resistance across the felt metal connection increased sharply during the shot to about 6 uOhm. Subsequent measurments of the resistance with a separate 100 A power supply and meters showed that the resistance is still at 6 uOhm. This level of resistance is unacceptable for operation.So, the run has been cancelled until further tests can be made and determine how the resistance can be returned to the normal level of less than 1 uOhm. Scorecard 9 shots 2 plasmas 1 fizzle 6 tests |
| Session Leader Comments | |||
| Sep 5 1996 09:19:44:780AM | Yuichi Takase | MP150A D(He3) Minority Heating at 8T
SL: Takase PO: Snipes EO: Silva Minority concentration scans at different densities. Measure power absorption from RF power steps. | |
| Sep 5 1996 09:30:02:550AM | 960905001 | Yuichi Takase | Shot 001 fiz
Start from 960904038, modify to 8T, 1.2MA, nel=1.0 Start with 5ms He3 puff @ 90V (B side upper) |
| Sep 5 1996 09:33:18:630AM | 960905002 | Yuichi Takase | Shot 002 plasma
7.8T, 1.2MA, nel=1.0, D: 0.85MW (crowbar @ 0.8s), E: 1.2MW He3 5ms @ 90V Adjust TF, delay RF turn-on, add power notch-out for next shot. |
| Sep 5 1996 09:58:40:950AM | 960905003 | Yuichi Takase | Shot 003 plasma
8.0T, nel=1.0, inj around 0.6s, didn't get to 8T till 0.8s D: 1.0MW (crowbar), E:1.2MW |
| Sep 5 1996 09:59:06:340AM | 960905004 | Yuichi Takase | Shot 004 OH test
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| Physics Operator Comments | |||
| Sep 5 1996 08:28:54:990AM | Joseph Snipes | MP150A D(He3) 8Tesla ICRF Heating
Session Leader: Yuichi Takase Physics Operator: Joseph Snipes Engineer in Charge: Frank Silva Overnight ECDC in deuterium. Power systems setup as for 960904038 except TF setup as for 960213016. Intend to run 8 T possibly up to 1.5 MA operation to get He3 minority heating with ICRF doing He3 concentration scans at different densities. Measurements will be made of the RF power absorption. | |
| Sep 5 1996 08:54:35:280AM | 960905001 | Joseph Snipes | Shot 1: Copied shot 960904002, but modified the density to 1 x 10^20 m^-2 and
made slight changes to the end of the flattop. Ip set to 1.2 MA. TF set to 8T flattop starting at about 0.6 sec to 1.2 sec. Fizzle! |
| Sep 5 1996 09:30:27:600AM | 960905002 | Joseph Snipes | Shot 2: Reduced Br offset by 0.5 mT to 5.5 mT. Good shot. TF fault after the
plasma. Reached 1.2 MA, but only 7.8 T. |
| Sep 5 1996 09:47:49:270AM | 960905003 | Joseph Snipes | Shot 3: Reduced Br offset by another 0.5 mT to 5 mT. Moved ZXL down by 4 mm
at 0.5 sec to accomodate the Fast Scanning Probe. Asked for 7kA more TF current to reach 8T. Good shot. Another TF fault after the plasma and instantaneous overcurrents at the alternator! OH resistance fault up to 3 uOhm. |
| Sep 5 1996 10:02:10:950AM | 960905004 | Joseph Snipes | Shot 4: OH test. OH resistance up to about 3.9 uOhm. Could be a problem.
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| Sep 5 1996 11:01:09:280AM | 960905005 | Joseph Snipes | Shot 5: OH test. OH resistance up to 3.95 uOhm.
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| Sep 5 1996 11:14:17:610AM | 960905006 | Joseph Snipes | Shot 6: OH test. OH resistance at 3.92 uOhm.
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| Sep 5 1996 11:20:53:770AM | 960905007 | Joseph Snipes | Shot 7: OH test. OH resistance at 3.89 uOhm.
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| Sep 5 1996 11:28:07:460AM | 960905008 | Joseph Snipes | Shot 8: OH test. OH resistance at 3.89 uOhm.
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| Sep 5 1996 11:53:26:040AM | 960905009 | Joseph Snipes | Shot 9: OH + TF test. Silva screwed up and ran other fields as well.
OH resistance up to 4.4 uOhm. There appears to be a real problem. |
| Sep 5 1996 01:57:41:990PM | 960905009 | Joseph Snipes | The OH2U resistance across the felt metal connection increased sharply during
the shot to about 6 uOhm. Subsequent measurments of the resistance with a separate 100 A power supply and meters showed that the resistance is still at 6 uOhm. This level of resistance is unacceptable for operation.So, the run has been cancelled until further tests can be made and determine how the resistance can be returned to the normal level of less than 1 uOhm. |
| Engineering Operator Comments | ||||
| Shot | Time | Type | Status | Comment |
| 1 | 08:43:14:690AM | Plasma | Ok | no faults |
| 2 | 08:54:58:360AM | Plasma | Ok | all pf dedendant supplies show low line phase seq.. |
| 3 | 09:30:19:160AM | Plasma | Ok | Timmed Overcurrent from alt. late in shot. |
| 4 | 09:53:56:470AM | Test | Ok | OH2U reading 3.89Micro Ohms. |
| 5 | 10:54:21:230AM | Test | Ok | OH2U 3.9519 Micro ohms. @ 5.0 KA |
| 6 | 11:07:59:140AM | Test | Ok | oh temp test |
| 7 | 11:15:33:110AM | Test | Ok | oh test temp |
| 8 | 11:22:52:340AM | Test | Ok | oh temp tests |
| 9 | 11:40:09:610AM | Test | Ok | oh test see log |