The DIONISOS Linear Plasma Device
The DIONISOS Linear Plasma Device
Plasma and materials
Plasma + Wall

The DIONISOS Linear Plasma Device

DIONISOS is a steady-state linear plasma device that gives researchers a unique window into how materials respond to the extreme conditions inside fusion devices. By combining plasma exposure with ion beam analysis and controlled radiation damage, DIONISOS helps researchers understand, and ultimately improve, the materials that will face fusion plasmas.

Principal Investigator
Principal Research Scientist
Team
Graduate Student
01
OVERVIEW

DIONISOS (Dynamics of ION Implantation and Sputtering Of Surfaces) is a steady-state linear plasma device located at the PSFC. It is designed to perform ion beam analysis (IBA) or controlled radiation damage during plasma exposure in order to study plasma-wall interactions for magnetic nuclear fusion relevant applications. The ion beam, consisting of either light or heavy species, is generated using a 1.7MV tandem ion accelerator.

 

The device parameters are:

  • Electron temperature Te: 15 eV
  • Electron density ne: 10­16-18-3
  • Particle flux: 10­20-23-2s-1
  • Heat fluxes: < 5 MWm-2
  • Magnetic field on-axis: 0.1T
  • Sample temperature: <1,200
  • Impact energy: 350 eV

 

 

 

02
THE DEVICE

DIONISOS consists of a sample transfer arm that can transfer samples from a load lock chamber (that can wet samples with Li in-vacuo) to an exposure chamber that is connected to a 1.7MV tandem accelerator, and a plasma source. The sample holder can be actively biased and heated, providing control over the incident ion energy (up to 350eV) and enabling sample temperatures of up to 1200℃. A base pressure of ~10-7 Torr is achieved in the exposure chamber.

03
PLASMA SOURCE

The plasma is generated inside a quartz tube by a water-cooled 13.56 MHz, 3 kW helicon Nagoya type III RF antenna. The source is enclosed in a faraday cage to protect surrounding equipment from RF interference. An air-cooling system ensures the source does not overheat during operation.

 

04
EXPOSURE CHAMBER

The PMI experiments are performed inside the exposure chamber. The plasma is confined to a cylindrical shape 50 mm in diameter by an axial magnetic field (<0.1T) generated by a set of four copper coils. The ion beam and plasma hit the sample at a 450 angle.

Diagnostics:

  • Nuclear reaction analysis (NRA) detector: 135° scattering angle
  • Rutherford Back Scattering (RBS) detector: 135° scattering angle
  • Optical emission spectroscopy (OES).
  • Retractable double probe.
  • Retractable emissive probe.
  • Transient grating spectroscopy (TGS, to determine material’s elastic and thermal properties during experiments).

05
CURRENT RESEARCH ACTIVITY
  • Dynamics of D retention in thin boron layers on W.
  • Thin Boron Layers and Defect Stabilization in W under Simultaneous Plasma and MeV Ion Beam Exposure
  • Role of high-flux plasmas on defect stabilization in W under simultaneous plasma and MeV ion beam exposure.
  • Investigation of SiC and SiC-Based Composites as Candidate PFC Materials